Nanoscribe’s Quantum X targets specific needs in modern industrial microfabrication, looking to extend Nanoscribe’s portfolio of high-resolution additive manufacturing systems for nano- and microscale components, with a new device specially designed for maskless lithography of micro-optics.
Nanoscribe prides itself on Quantum X’s two-photon grayscale lithography (2GL), a printing technology that combines grayscale lithography with Nanoscribe’s two-photon polymerisation technology. The benefits of 2GL are its accuracy and contouring capabilities: Quantum X produces simple and complex optical shapes with variable feature heights within each scan field. Discrete and accurate steps, as well as essentially quasi-continuous topographies, can be printed in one step, without the need for several lithography steps or multiple mask fabrication.
For more information on Quantum X, click here.
